Photoresist Supplier in Malaysia
- Also known as
- Photo Resist
- Lithographic Resist
Photoresist is supplied for semiconductor, printed circuit board and advanced packaging lithography in Malaysia. This page covers photosensitive materials used to form a temporary patterned layer for etching, deposition, plating and other precision microfabrication steps.
Buyers may require positive or negative liquid resist, dry-film photoresist or a system designed for a specific semiconductor and packaging process. Selection depends on exposure wavelength, film thickness, resolution, substrate, developer, bake sequence and the equipment already qualified on the line.
Applications include wafer fabrication, PCB imaging, wafer-level packaging, redistribution layers, microelectromechanical devices and precision electronic pattern transfer. Photoresist is a formulated process material, so compatibility and qualification matter more than choosing only by the broad product name.
Send the resist tone and form, substrate, target thickness, exposure and developer system, quantity and delivery location with your enquiry. Availability, packing, storage documentation and delivery timing are confirmed for the selected photoresist.
- Grade
- positive, negative, dry-film, semiconductor, PCB
- Appearance
- formulated liquid or dry film, depending on resist type
Photoresist grades and forms
We supply several forms to suit different formulating and dosing setups. If you need a size that is not listed, ask us.
| Grade | Form | Assay | Typical use | Packing |
|---|---|---|---|---|
| Positive photoresist | formulated liquid | — | Photolithography processes where exposed regions become more soluble during development | Confirmed with the quotation |
| Negative photoresist | formulated liquid | — | Imaging processes where exposure crosslinks or hardens the retained resist pattern | Confirmed with the quotation |
| Dry-film photoresist | laminated photosensitive film | — | Printed circuit board imaging and related pattern-transfer operations using film lamination | Confirmed with the quotation |
| Advanced packaging photoresist | formulated liquid | — | Wafer-level and package-level lithography requiring a defined film thickness, resolution and process window | Confirmed with the quotation |
How to buy photoresist from ChemTrade
Request a quote for photoresist
Use the form below to request a quotation. You can also email sales@chemtrademalaysia.com or send us a message on WhatsApp.
Specifications
| Parameter | Value | Method |
|---|---|---|
| Product family | Photosensitive lithography material | — |
| Commercial forms | Liquid resist or dry film | — |
| Image tone | Positive or negative, according to grade | — |
Photoresist applications
Safety and handling
Protect from light, heat and contamination and keep under the temperature and shelf-life conditions stated for the selected resist system.
Common questions about photoresist
What is the difference between positive and negative photoresist?
Positive resist removes the exposed region during development, while negative resist retains the exposed and crosslinked region. The process design determines which tone is required.
Should I request liquid or dry-film photoresist?
Liquid systems are coated onto the substrate, while dry film is laminated. State the substrate, coating or lamination equipment, target thickness and patterning process before grade selection.
Which photoresist details are required for semiconductor use?
Provide the exposure wavelength, resist tone, target film thickness, resolution, substrate, bake conditions, developer system and any incumbent product reference used in the qualified process.
Can photoresist be supplied for printed circuit board production?
PCB processes may use liquid or dry-film resist depending on the imaging, etching and plating sequence. Send the board process and thickness requirement with the enquiry.
How are shelf life and storage conditions confirmed?
Storage temperature, light protection, shelf life, packing and transport controls vary by formulation and are confirmed for the quoted photoresist system.